Used NOVELLUS Concept 3 Speed NEXT #9390429 for sale

NOVELLUS Concept 3 Speed NEXT reactor is an advanced, high throughput deposition system designed for movie deposition applications. It features a modular and scalable architecture that allows for a variety of configurations, from single-wafer to full-wafer deposition, that can be tailored to wide range of customer process needs. The system is engineered for superb uniformity of film properties, including thickness uniformity and repeatability, and delivers layer-to-layer and wafer-to-wafer consistency across all substrate types. Concept 3 Speed NEXT features an industry-leading high-throughput process chamber, capable of delivering up to four times boost in speed and capacity over traditional systems. It utilizes a vertical lift process chamber, as well as a top-mounted enhanced wafer geometry module, both of which enable uniform thin film performance to be achieved at high deposition rates. The patented Dynamic Activity Control (DAC) technology further improves speed and uniformity across all wafer sizes. The user-friendly advanced platform of NOVELLUS Concept 3 Speed NEXT provides an intuitive interface that is always up to date, making it easy to configure and control the reactor. Concept 3 Speed NEXT is also a secure platform capable of operating under strict cybersecurity protocols, providing access to more customer and process data for future system updates. Overall, NOVELLUS Concept 3 Speed NEXT is the ideal reactor for high throughput deposition applications that require superior film uniformity and repeatability. It combines an efficient vertical process chamber, enhanced wafer geometries, accelerated speeds, and secure data analysis to offer the highest performance and throughput in the industry.