Used NOVELLUS Concept 3 Speed #293592759 for sale

NOVELLUS Concept 3 Speed is a high-performance chemical vapor deposition (CVD) reactor used in the semiconductor and photovoltaic industries. It offers faster substrate loading and unloading, as well as increased throughput and better process uniformity. Concept 3 Speed has three stages of processing, each designed to produce different results from CVD processes. The first stage consists of a plasma generator and a carousel-controlled crucible that allows for automated substrate loading. This stage helps to ensure an even coating of the desired material by controlling the gas used in the plasma reaction. The second stage is designed for high-rate deposition and utilizes a Shielded Multi-UT™ (Uniformly Tapered) showerhead. This showerhead is designed to provide a precise, uniform distribution of deposition gases, resulting in faster and higher film deposition rates. Finally, the third stage is used to enable the high-rate deposition and rapid cooldown of substrates. It is comprised of a Cool-down Chamber, which directly cools the substrate surface to enable film cooling and lower material temperatures. This helps to reduce the risk of overheating, which can lead to unwanted results. Additionally, the third stage also incorporates a low-pressure system which evacuates gases present in the chamber inner volume to keep the chamber clean. In conclusion, NOVELLUS Concept 3 Speed is an advanced, high-performance CVD reactor that allows for rapid substrate loading and unloading, improved throughput and better process uniformity. It is composed of three stages, each designed for different yet essential functions in order to provide a precise and consistent coating for any substrate during the CVD process.