Used NOVELLUS Concept 3 Speed #9364308 for sale

NOVELLUS Concept 3 Speed is a highly innovative chemical vapor deposition (CVD) reactor that is designed for increased processing capabilities. It is a revolutionary tool for integrated circuit fabrication and semiconductor device manufacturing. Concept 3 Speed employs a single-wafer rotating and stationary cathode design, allowing it to offer excellent uniformity and deposition rate. Its advanced and flexible cluster tool architecture provides for easy integration and maximized coexistence with all NOVELLUS systems. This CVD reactor comes with an upgradeable automation module that offers high levels of through-put, and superior quality processing results. NOVELLUS Concept 3 Speed has a high flow gas panel for improved productivity. It features two adjustable tilted shower heads, enhanced with a pre-mixing chamber that offers optimal temperature, pressure, and gas flow variance control. This Technology can be operated with either an inline or a cross-flow gas mix, providing excellent material uniformity. Concept 3 Speed also offers improved process stability with its integrated heat source. This Heat Source Equipment (HSS) feature an advanced tri-laminar diffusion plate for uniform heat distribution, which allows for optimal material cost. The unique self-cleaning pusher plate of NOVELLUS Concept 3 Speed eliminates the possibility of particle buildup and provides a consistent process flow. In addition, automated off-line process qualification enables the quick tuning of coatings and optimised film/substrate interface characteristics. The performance of Concept 3 Speed is enhanced by its advanced multi-position wafer manipulation system (PWMS). This unit supports wafer seaming and ring loading, offering flexibility in wafer and precursor handling. In addition, the PWMS enhances the speed of the machine by reducing substrate handling time. NOVELLUS Concept 3 Speed offers unmatched capabilities, with improved product durability, enhanced process flexibility and high-yield productivity. It is a cost-effective and reliable CVD reactor solution for semiconductor device manufacturers.