Used NOVELLUS Concept 3 Triple Speed #9237847 for sale
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ID: 9237847
Wafer Size: 12"
HDPCVD System, 12"
Main mini environment platform
(3) Loader systems: ASYST IsoPort
Handler system: BROOKS AUTOMATION Magnatran 7
Wafer shape: SNNF
(3) Exhausts: Bottom feed
Cooling water: PCW
User interface Windows NT
Mainframe:
Control system: Ethernet
MF FAC Routing: Front, Through-the-floor
Front end robot: BROOKS AUTOMATION Magnatran 7
Load lock & Front end option:
Load locks: C3 WTM Standard SWLL
SECS / GEM
Signal tower
Pod type: 25 Wafers (2) FOUP
BROOKS AUTOMATION Fix load 6M
System controller:
Controller type: Enhanced (NT) with HSMS & GEM
Controller UPS: YES -FAC UPS INF
Electrical INF: Bottom feed AC cables
System EMO type: Push, Turn to release style
EMO Guard ring option
Transfer chamber:
(3) PEC Stations
Transfer chamber manual lid lift
Robot blade: Dual blade with minimum contact
Robot type: BROOKS AUTOMATION Magnatran 7
Pumps:
Fore-line heat trace: YES-105C
Chamber A / B / C:
Chamber type: SPEED HDP ILD
Process kit: NanoFill II
ESC: HEX ESC
TEMP Monitor: ATC NTM Delta
Manifold D orifice: 0.020" For long injector
Manifold G orifice: 0.028" For short injector
RF Generator HF: ADVANCED ENERGY APEX 10 kW
RF Generator LF: ADVANCED ENERGY PDX 8000 8 kW
Pedestal heights: 1.35"
Dome matching network: High power dome
Turbo screen: Louvered screen
(2) Turbo pumps: LEYBOLD MAG2000
Pressure controller:
Throttle valve: MKS 153D
Manometer: MKS 10 Torr / 100 mT
Pressure gauge: DATUM 2000 Dual CH
Gate valve: VAT Pendulum valve
Slit valve o-ring: CHEMREZ
Nozzle: (6) Long & (24) Short injectors
Missing parts:
(3) 05-363589-00 / Retrokit, coulombic ESC
(3) 796-212642-001 / VLV, VAC, VAT, Bonded K910
(3) 04-353972-00 / KIT, Pendulum valve, ISOLA
Line voltage: 208 VAC / 60 Hz
CE Marked.
NOVELLUS Concept 3 Triple Speed Reactor is a high-performance metalorganic chemical vapor deposition (MOCVD) system designed for the highest deposition rate and deposition uniformity. The three-level power supply enables full and balanced control of the process pressure, temperature and reactant delivery, producing high-end multilayer semiconductor devices with excellent performance characteristics. The machine is equipped with three high-quality quartz tubes and features a large open area for easy access to the growth zone. The three engines are mounted in the same plane to ensure a balanced and uniform flow of the process gases. The closed chamber design helps maintain the temperature and pressure inside the reactor. The patented Concept 3 Triple Speed independent power supply allows for rapid and precise deposition control by independently controlling the temperatures of each deposition tube. NOVELLUS Concept 3 Triple Speed reactor's fully automatic operation and powerful deposition control system ensure a battery-compliant process with excellent repeatability and minimal downtime. The multilevel power supply helps maintain the required temperature and pressure levels, while the advanced process control software provides detailed process monitoring and control capabilities. The front panel user interface is intuitive, allowing for easy operation and troubleshooting. Concept 3 Triple Speed utilizes a high-accuracy low-pressure quartz flowmeter for efficient gas delivery and precise control of the growth process. The power supplies feature multiple operating modes, allowing operators to select from single, dual, or triple speed deposition modes, as well as between linear and logarithmic control for accurate delivery of process gases. In addition, the lower part of the Stainless Steel chamber allows for easy access to samples, helping to improve the throughput of the deposit and reduce the time required for sample collection. The result is an efficient, reliable and precise three-level power supply that provides optimal results, every time.
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