Used NOVELLUS Concept 3 Vector Express #293641738 for sale

NOVELLUS Concept 3 Vector Express Reactor is a revolutionary advanced physical vapor deposition (PVD) equipment that utilizes ionized atoms, or ions, to deposit ultra-thin coatings of materials onto different surfaces. The reactor sections include an ion source and magnetron sputtering chambers, and are powered by dual radio frequency (RF) generators and a powerful pulse generator. The ion source enables the creation of ionized gas from components such as nitrogen, argon, and other inert gases. The magnetron sputtering chambers then use these ions to sputter mount targets consisting of specific materials. The materials being deposited can range from copper or aluminum, to tungsten, molybdenum, titanium, or other metals and alloys. The Vector Express Reactor is a high-precision piece of equipment. It features a dual-target generator and is capable of depositing multiple materials with varying thickness onto substrates. The dual-target feature allows two target materials to be used simultaneously while the exact layer thicknesses are controlled with desktop software. The thickness of the coating can be controlled with precision to up to a resolution of one nanometer. The Vector Express Reactor also uses an advanced multi-surface substrate holder system. This holder unit can be adjusted based on the type of material that is being deposited, providing for uniform deposition of films. The holder machine can also be used to fuel localized ionization on the substrate. This creates a uniform and homogeneous coating being deposited. Though the Vector Express Reactor is a highly capable tool, its complexity and high cost of ownership is best suited for larger production environments. This specialized deposition reactor is well suited for large-scale production of films with optimal film characteristics and high throughputs. Its digital control of the layer thicknesses and local ionization fuel are also ideal for Semiconductor, MEMs, LED, and optical device manufacturing.