Used NOVELLUS CONCEPT 3 Vector #9169845 for sale
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NOVELLUS CONCEPT 3 Vector is a multi-axis chemical vapor deposition (MPCVD) reactor designed for the deposition of complex nanostructures. It is ideal for advanced materials and device applications that require greater material uniformity and conformality. The Vector includes two independently controlled independent axes to ensure that the same process conditions are applied to larger substrates. The two-axis approach ensures that the etch process across the entire substrate is uniform and consistent, thereby resulting in uniform conformance and desirable electrical, optical, or mechanical characteristics. The core of the Vector is its chamber and the two-axis linear transfer system. The chamber is pressure controlled and the temperature is controlled via heating elements and chuck temperature sensors. The transfer system includes a pair of linear motors, along with a translation stage, to precisely position and move the wafer in three axes with extremely high accuracy. Within the chamber, reactors and gas clusters work together to provide high-precision sputtering and etching processes. In PVD, a plasma is used to create an electric discharge on the target materials being processed. This electric discharge is used to evaporate material from the target material, which then deposits on the desired substrate. In the etching process, gases are introduced into the chamber, which react with the target material and create a thin protective layer or etch patterns on the substrate. The Vector also includes multiple process tools, such as the chamber liners and process shrouds, which provide additional uniformity and conformality to the etching process. These process tools also prevent contamination within the chamber and allow for rapid thermal cycling. The Vector's design allows for high repeatability, low defect levels, compatible with MEMS processing and biocompatability. Its high-resolution, low-defect imaging system allows for process monitoring and control. The Vector provides rapid thermal cycling and maintains high uniformity throughout the process, all while maintaining a low total cost of ownership.
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