Used NOVELLUS CONCEPT 3 Vector #9191085 for sale

NOVELLUS CONCEPT 3 Vector is a high-performance deposition reactor used in chemical vapor deposition (CVD) applications. It features multiple integrated process chambers that enable low-pressure chemical vapor infiltration (CVI), high-pressure CVD, atomic layer deposition (ALD), and plasma-enhanced CVD (PECVD). The vector utilizes a closed-loop, resonance-controlled substrate heater to ensure highly uniform thermal performance across the substrate during deposition. The Vector is outfitted with programmable gas distribution plate that allows for ultimate flexibility, ensuring accurate and precise delivery of reactant gases. Its gas distribution plate incorporates gas switching valves, designed to quickly switch out spend reactant gases and replace with fresh reactant gases as needed - thereby reducing spend gas efflux and improving process yields. Additionally, the Vector has configurable automated injection systems and hot filament emitters, allowing for intricate control over the reactive species present in the deposition chamber - providing better control of the deposition process. The Vector is also designed for ultra-high temperatures, enabling high performance applications such as metal-organic chemical vapor deposition (MOCVD) and organic chemical vapor deposition (OCVD). Its closed-loop, hollow-cone crucible design creates a unique mixing and chemical-transferring environment, allowing for improved reactivity control and better process monitoring and control. The Vector also features an advanced temperature control system to ensure highly precise temperature control and uniformity within the deposition chamber. Its proprietary thermal management system encompasses multiple layers of thermal insulation between hot zones and its internal parts, providing an even temperature distribution across the entire substrate surface. This advanced thermal management system, coupled with the Vector's high-performance hardware, provides outstanding repeatability and uniformity across deposition processes. CONCEPT 3 Vector is a great tool for CVD applications, providing highly precise temperature control, uniformity, and repeatability. It is well-suited for complex processes such as MOCVD and OCVD, allowing superior thermal performance and a wide range of reactant gases.