Used NOVELLUS CONCEPT 3 Vector #9281484 for sale

NOVELLUS CONCEPT 3 Vector is a single-wafer chemical vapor deposition (CVD) reactor equipment designed for advanced metal deposition processes. It features a three-zone design that includes a preheat chamber, a deposition chamber, and a cooling zone. The preheat chamber is capable of ramping to temperatures of 450°C with little hot band, allowing preconditioning of a variety of wafer surfaces. The deposition chamber features a unique parallel-plate configuration with two independently operated plasma chambers, allowing for low-temperature control of the source gases and better uniformity of deposition. The cooling zone allows for rapid cooling of the wafers and includes an automated QC port for fast wafer analysis. CONCEPT 3 Vector is designed with high throughput in mind, and its MOVe GAP wafer-handling system is optimized for quick wafer processing. It comes with a number of features that help improve uniformity, minimize wafer spacing, and minimize stress on the wafers. Furthermore, Vector is equipped with a range of sputtering and electrochemical processing tools, such as a tilt-angle sputtering carousel, a rotating pedestal for enhanced through-wafer uniformity, and a unit for tilting the carousel for optimum station-to-station uniformity. The machine is also designed with features such as film containment cups to reduce metallic contamination and an automated interlock tool for process optimization. Vector's process control is enabled by NOVELLUS proprietary SenPlace™ software, a platform that utilizes advanced process monitoring, control, and optimization techniques. SenPlace allows users to monitor a variety of process parameters in real-time, adjust process recipes on the fly, and ensure uniformity across the wafer surface. It also offers a variety of alarms and safety features to ensure that processes are carried out without any unexpected results. Overall, NOVELLUS CONCEPT 3 Vector is an advanced and versatile single-wafer deposition asset designed with throughput and uniformity in mind. It's suitable for a variety of deposition processes, including low temperature CVD, aluminum nitride, titanium nitride, and tungsten.