Used NOVELLUS CONCEPT 3 #162059 for sale

NOVELLUS CONCEPT 3 is a state-of-the-art chemical vapor deposition (CVD) reactor designed for high-volume industrial production of semiconductor wafers. It is engineered to achieve superior process uniformity and device quality, which are essential for producing reliable integrated circuits. CONCEPT 3 features a three-chamber design. The top chamber uses a platen made of quartz and source gas inlets located in the walls to create the environment necessary for diffusing and depositing successive layers of film onto the substrate. The middle chamber provides the temperature control needed to sustain the reaction of the volatile reaction species which are produced in the top chamber. The bottom chamber is a transfer zone that transports wafers between chambers as needed. The three chambers provide simultaneous deposition of high-quality thin films on multiple wafers. The reactor's electrodes are positioned in close proximity to the substrate, allowing for excellent uniformity. This arrangement also affords the ability to heat or cool the substrate independently and precisely by using frequency-controlled RF power sources. This feature enables precise control of film thickness, composition and thermal stability within each wafer. NOVELLUS CONCEPT 3 utilizes state-of-the-art safety and automation features. The use of man-machine interface allows for maximum optimization of parameters and remote monitoring of process status. Additionally, the software is designed for high-volume production, data collection and reporting. CONCEPT 3 is an ideal choice for companies looking for a high-performance CVD reactor. Its unique design and advanced features make it an excellent choice for producing reliable, high-quality integrated circuits in an efficient and cost-effective way.