Used NOVELLUS CONCEPT 3 #293644795 for sale

NOVELLUS CONCEPT 3 is a high-performance, PECVD (Plasma Enhanced Chemical Vapor Deposition) reactor designed for deposition and etch processes, primarily in the semiconductor industry. This tool is a highly precise and powerful deposition tool for high-volume, large-area lens components. CONCEPT 3 utilizes a unique reactor chamber architecture that features four independently positioned spaces. Each of these spaces can independently contain separate CVD processes and/or etch processes. The result of this unique design is that four process modules can be run simultaneously, allowing for quicker throughput times and high uniformity of processes. The PECVD reactor employs a variety of etching processes for particular needs, including inductively-coupled plasma etch (ICP Etch) and reactive ion etch (RIE). This is designed to facilitate the deposition and etching of uniform and precise filmcoatings on large, multi-layer wafers and components. NOVELLUS CONCEPT 3 is equipped with advanced automation and process control software that allows users to optimize their process parameters on the fly. Users can set up the entire process with a few simple steps and rapidly change process conditions in the middle of a given run to improve the efficiency of their production. The end result is better quality, faster production times, and reduced product costs due to more precise control of the substrate. CONCEPT 3 also features a unique 'Hybrid Cooling' system that provides flexible temperature control over each of the four chambers. This feature makes the tool incredibly versatile and allows for higher temperatures for faster etching of harder materials or lower temperatures for delicate etching work. It also helps to prevent warping of the substrate due to extreme temperature differences between the different chambers. Overall, NOVELLUS CONCEPT 3 is an advanced and versatile PECVD reactor tool that is designed to provide high-speed deposition of advanced multi-layer wafers and components. It features an innovative chamber architecture that can independently house multiple processes, advanced process automation and control, and a hybrid cooling system that provides greater temperature control. All of these features make CONCEPT 3 an ideal choice for rapid and precise deposition of large area components.