Used NOVELLUS CONCEPT 3 #293644796 for sale

NOVELLUS CONCEPT 3 is an advanced planar angular PECVD (plasma enhanced chemical vapor deposition) reactor designed to deliver superior film deposition performance. This system is optimized for ultra-thin deposition and modification of silicon nitride, silicon oxynitrides and silicon oxides with excellent uniformity and film quality. With its unique dual-frequency compatibility, CONCEPT 3 enables improved particle density control and superior film performance over conventional systems. NOVELLUS CONCEPT 3 reactor is comprised of an advanced, multi-frequency PECVD process chamber and an RF matching network. The RF matching network is designed to provide optimal impedance matching between the power generator and the process chamber, and is adjustable for both parallel and series resonance as well as for low and high frequencies. In addition to eliminating hot spots and tailoring the impedance for improved process uniformity and repeatability, this RF matching network design improves power efficiency and reduces costs of ownership. The process chamber of CONCEPT 3 is equipped with a high-density RF generator and a dual-frequency excitation system to generate both low and high frequency waves simultaneously. This helps to preserve the integrity of the process plasma while driving rapid and uniform film growth on the substrate surface. This two-frequency arrangement also helps to reduce the external etch rate and prevents the release of unwanted particles during reactive ion etching (RIE) steps. The self-contained PECVD system along with the specially designed code-compliant process chamber has been rigorously tested for reliability and longevity. The robust design ensures optimal performance over a range of various industrial processes and applications. NOVELLUS CONCEPT 3 also features touch-screen cluster controls, web-based application management, and powerful diagnostics and recipe-tracking capabilities. Overall, CONCEPT 3 is one of the most advanced PECVD systems on the market, offering superior process control, repeatable performance, and efficient film deposition. It is ideal for a wide variety of deposition processes, such as ultra-thin film deposition, hard mask deposition, patterning, and metal/dielectric layers formation. Its combination of powerful features, advanced technology, and user-friendly design makes NOVELLUS CONCEPT 3 a reliable and efficient PECVD solution for any modern fabrication environment.