Used NOVELLUS CONCEPT One-150 #293758274 for sale

NOVELLUS CONCEPT One-150 is a mid-sized gas-plasma chemical vapor deposition (CVD) equipment for use in the semiconductor industry. The reactor features an advanced design and robust construction to enable high-performance process results. The One-150 is truly a universal platform for deposition applications, utilizing advanced design features and smart process controls to support a wide range of process chemistries with high selectivity. The reactor is equipped with a 1300 W high-frequency power source, a vacuum system capable of reaching pressures below 40 mTorr, and a NOVELLUS ALC gas manifold that can handle up to 10 gases. It also boasts an impressive number of process sensors (temperature, pressure, and wafer temperature) and feedback loops to enable fine control of process parameters. The One-150 is also outfitted with zone temperature control, an impressive electrostatic chuck capability, and a cryopump-equipped pump package that gives the CVD unit a maximum process window. The reactor boasts a flexible four-zone configuration, with the two central process zones controlling temperatures. This approach is designed to ensure precise process control, allowing for exacting process results. The zones are all optimized for high-productivity CVD processing, with precise temperature set points, cool-down times, target temperatures, and accurate control of the deposition rate. The One-150 is also equipped with advanced process control software. This ensures precise conformal film thickness across the entire wafer, with highly uniform film properties and excellent uniformity within the tolerances set by the customer. The software has sophisticated parameter control and can optimize process conditions for a variety of process chemistries. It also includes a comprehensive database of process recipes, helping to ensure repeatability through a controlled and reproducible process. In conclusion, NOVELLUS CONCEPT ONE 150 is a powerful CVD machine, designed to meet the demanding needs of the semiconductor industry. With its advanced design and robust construction, it supports a wide range of process chemistries to deliver high-performance process results. Its sophisticated process control software enables precise conformal film deposition with excellent uniformity across the entire wafer. In all, the One-150 is a reliable and highly capable machine that is sure to become a valuable asset in any semiconductor processing facility.