Used NOVELLUS CONCEPT One-150 #293807073 for sale

NOVELLUS CONCEPT One-150 is a single chamber chemical vapor deposition (CVD) tool developed and manufactured by NOVELLUS Systems Inc. It is a highly automated tool that enables the deposition of thin films in a controlled, uniform manner. NOVELLUS CONCEPT ONE 150 features a rectangular reaction chamber with a fixed volume of 150 cubic centimeters (cc). The chamber is also insulated to maintain thermal stability. The tool also features integrated inert gas and chemical vapor injection, as well as in-situ pressure measurements. This provides the ability to accurately control the deposition process parameters like pressure, temperature and reactant concentrations. In order for the chamber to be heated and cooled, the machine is equipped with a quartz electric resistance heater and a liquid nitrogen heat transfer block. The machine is encased in an advanced multi-zone temperature controller, which allows for independent zone heating and cooling, as well as close temperature control. CONCEPT ONE - 150 is a benchtop CVD system that is controlled by a programmable central processing unit (CPU). It is capable of several pre-programmed applications, such as chemical vapor deposition, thermal processing and cycling. The reactor allows for the deposition of a variety of thin films, including fluorinated polysilicon and silicon nitride. It is also used to coat wafers with small particles of metals, alloys, dielectrics and insulators. NOVELLUS CONCEPT ONE - 150 has the capability to maintain low process drift and execute long runs which makes it well suitable for mass production. It has been designed for minimal maintenance and high uptime in order to reduce operational costs. The tool is highly reliable and simple to operate and adjust, with a very robust and repeatable deposition platform.