Used NOVELLUS CONCEPT One-150 #293813033 for sale

Manufacturer
NOVELLUS
Model
CONCEPT One-150
ID: 293813033
Wafer Size: 6"
Plasma-Enhanced Chemical Vapor Deposition (PECVD) system, 6".
NOVELLUS CONCEPT One-150 is a high-performance reactor used for advanced semiconductor processing. Utilizing either Chemical Vapor Deposition (CVD) or Atomic Layer Deposition (ALD) processes, NOVELLUS CONCEPT ONE 150 can be used to deposit thin films onto and within substrates. It interfaces with a variety of process gasses, substrate materials, and emission control systems, making it a versatile and adaptive tool for fabricating nano-scale structures. CONCEPT ONE - 150 is based on a durable and tried-and-true XeF2 reactor design that ensures reliable, repeatable processing for various film deposition applications. The reaction chamber itself consists of the following components: the chamber, the lid assembly, a source compartment, a power supply, a gas distributor and delivery system, a gas exhaust port, sample ports, and the process chamber. All of these components may be customized for improved deposition rates and faster material growth. CONCEPT One-150 is capable of depositing reactants at top speeds of 150x10-6 Torr, allowing for faster device fabrication and improved throughput. Additionally, hydrogen-free deposition processes are supported as well, which offers a cost-effective outlet for advanced semiconductor designs. NOVELLUS CONCEPT ONE - 150 is designed to be simple to use and maintain, with optional computer automation and easy-to-understand human-machine interfaces. It is also equipped with comprehensive state-of-the-art diagnostics such as programmable leakage tests and self-adjusting tuning ranges, which ensure optimum conditions are always maintained. CONCEPT ONE 150 also comes with a variety of safety protocols in order to protect personnel and property, including advanced fire suppression, vacuum level control, automatic shut-off, and pressure control systems. Overall, NOVELLUS CONCEPT One-150 offers a versatile and reliable single-wafer reactor that is capable of producing uniform and defect-free thin films. It is an ideal solution for an array of advanced semiconductor processing applications that demand high precision, speed, and repeatability.
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