Used NOVELLUS CONCEPT One-150 #9248601 for sale

NOVELLUS CONCEPT One-150 is a single-chamber, batch-type CVD/ALD (Chemical Vapor Deposition / Atomic Layer Deposition) reactor suitable for research and development as well as a full range of advanced semiconductor device fabrication processes. The One-150 offers a compact design, allowing for integration in both manual processing systems and automated cluster tools. The reactor chamber is lined with SUS316 stainless steel and provides an additional lightweight aluminum alloy lid. The chamber dimensions are 150mm (Ø) x 150mm deep, and it can hold up to 30 wafers with 6 inch diameter (200mm) or 12 wafers with 4 inch diameter (100mm). It is provided with a closed RF heating equipment, allowing uniform temperatures up to atmospheric pressure or lower. A fuel gas flow system is available that supports a wide range of gases, including oxidizers, reducers, nitrides, and fluorides, and special chambers can process extremely reactive materials. The reactor is provided with a low-load Electrostatic Chuck (ESC) capable of holding up to six wafers per batch. The ESC is also easily automated and can be configured for manual or integrated in a cluster tool. The source is designed to allow sources to be dispatched from the same reactor, allowing for multiple precursors. The control unit includes fine control of the ESC grid voltage and a real-time display of all critical parameters. A high-pressure gas delivery machine allows rapid changes in pressure, allowing for short processing runs. The reactor also offers controllable deposition rates and temperature, as well as adjustable total process time. The One-150 allows advanced multi-technology processing capabilities, with the ability to simultaneously perform annealing, oxidation, deposition, and etching. It can also support more complex processes such as atmospheric and in-line deposition, etching, oxidation, etching, deposition, and nanotechnology applications. In addition, its design also facilitates integration into cluster systems. In summary, NOVELLUS CONCEPT ONE 150 is an efficient and compact CVD/ALD reactor, featuring advanced multi-technology processing capabilities and easy integration with cluster systems. Granular control of deposition rates and temperature, reliable RF heating tool, and precision fuel gas flow design make this asset suitable for both research and development and full-scale device fabrication processes.