Used NOVELLUS CONCEPT One-150 #9248603 for sale

NOVELLUS CONCEPT One-150 is a chemical vapor deposition (CVD) reactor designed for use in advanced semiconductor manufacturing. It offers precision processing of materials, such as polysilicon, silicon oxide, and aluminum titanium nitride (AlTiN) films. With optimized source delivery and control, NOVELLUS CONCEPT ONE 150 is capable of depositing precise and uniform layers with thickness resolution as low as 4 nanometers. It provides consistent, repeatable results for both large-scale and small-scale production. CONCEPT ONE - 150 is designed for improved productivity and is compatible with a wide range of n-type and p-type silicon substrates. Its proprietary source delivery equipment ensures delivery of a steady stream of chemicals without leakage or undesired impurities. The delivery of chemicals is also precisely controlled by the system, enabling consistent layers with uniformity of less than ±2%. The reaction chamber of CONCEPT One-150 is designed for tightly controlled and efficient mixing of source gas, enabling efficient reactions and improved film quality. The reaction in NOVELLUS CONCEPT ONE - 150 is controlled with advanced software. It features a powerful and robust suite of process control capabilities, allowing for real-time control, data collection, and analysis. The display unit of CONCEPT ONE 150 is designed for intuitive operation, allowing operators to quickly access and interpret information needed to maintain the desired process. Advanced diagnostics, including on-line video of the reaction chamber, provide detailed performance analysis. The machine is also designed with safety features such as overpressure protection, environmental monitoring systems, and active ozone monitoring. NOVELLUS CONCEPT One-150 offers the capability to process layers of sub-nanometer dimensions, enabling fabrication of advanced semiconductor devices. It has been successfully used in a variety of CVD applications, for example, deposition of aluminum nitride gates for advanced VLSI process. The tool provides improved repeatability for process optimization and throughput, enabling faster and more reliable production. NOVELLUS CONCEPT ONE 150 is an example of cutting-edge CVD technology for advanced semiconductor manufacturing.