Used NOVELLUS CONCEPT One-150 #9250099 for sale

NOVELLUS CONCEPT One-150 is a Single-Wafer Chemical Vapor Deposition (CVD) reactor. It is designed for deposition of various dielectric and conductive materials on substrates under precise control conditions. The reactor employs a single-wafer loadlock, showerhead distributor, gas drain manifold, two RF sources, and a radio frequency (RF)-driven turbine. The single-wafer loadlock enables NOVELLUS CONCEPT ONE 150 to process one substrate at a time. The system is designed with quick-change liners, allowing the process chamber to be quickly converted to a new recipe on demand. The loadlock is also outfitted with a furnace to allow controlled thermal baking of the substrate before a deposition is initiated. Additionally, a sophisticated pump control system ensures the chamber is held precisely at atmospheric pressure before the final substrate loading. Next, the showerhead distributor distributes the process gas uniformly over the wafer surface to ensure uniform film deposition. This precision distribution is achieved by using three independent flow paths, each with 30 separate exit ports. Flow control is enhanced by the dual-heath RF source and turbine, which are used to create a more uniform distribution at higher flow rates. After the initial distribution, the gas is removed from the reactor by the two-stage gas drain system. The first stage ensures that the gas is quickly drawn away from the substrate and exhausted from the chamber. The second stage uses a recirculation chamber that captures residual contaminant for further analysis. Finally, the radio frequency (RF)-driven turbine creates an alternating magnetic and electric field inside the reactor. This alternating field allows electrons to oscillate, creating a high energy state ideal for plating atoms from the gas sources to the substrate. In conclusion, CONCEPT ONE - 150 is a versatile single-wafer CVD reactor designed for precise deposition of various materials. It features a single-wafer loadlock, showerhead distributor, gas drain manifold, two RF sources, and an RF-driven turbine. These components work together to create thoroughly uniform deposition with minimal contamination and faster process rates.