Used NOVELLUS CONCEPT One-200 #293760904 for sale
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ID: 293760904
Wafer Size: 8"
PECVD System, 8"
Process: TEOS
Material: Aluminum
PSG
(2) 2000 Porters
(3) 1660
(2) HORIBA / STEC 500
EDWARDS iXH1210 Dry pump
EDWARDS iQDP80 Dry pump
EDWARDS Atlas Abatement system.
NOVELLUS CONCEPT One-200, also called the 'Concept One' is a unique advanced dry etch reactor, used for high-volume production of nanoscale microelectronic devices. It is capable of reliably processing a variety of semiconductor materials, including silicon, germanium, and gallium arsenide, at high temperatures and over a wide range of process conditions. CONCEPT One-200 is designed to provide unmatched temperature stability, with a temperature profile that stays within 0.5°C of the target set point, even with variations in load. This is accomplished by the on-board temperature monitoring equipment. Additionally, it has a Digital Automatic Flux Compensation feature which further enhances temperature stability by minimizing flux variance, keeping it at its lowest level possible. NOVELLUS CONCEPT One-200's chamber is lined with a graphite-based material to reduce magnetic fields, thus preventing product contamination, and it has a wide range of side shields to protect the product from direct exposure to the plasma. The reactor has a source filament designed to optimize ionization while minimizing erosion, and a uniform gas distribution system to ensure uniform material etching. CONCEPT One-200 is equipped with an intelligent automated process control unit to enable remote monitoring and diagnostics, as well as temperature and pressure profiling capabilities to enable optimal process control. Another feature of the machine is the on-blade heater, which reduces thermal conductivity, allowing higher plasma densities and improved heat distribution within the etch chamber. NOVELLUS CONCEPT One-200 provides unparalleled performance, with the highest process quality and repeatability available in the industry. It is the perfect choice for high-volume production of nanoscale semiconductor devices, enabling the development of extremely high-performance applications.
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