Used NOVELLUS CONCEPT One-200 #293763726 for sale
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ID: 293763726
Wafer Size: 8"
Vintage: 1992
PECVD System, 8"
Process: SiO2 / TEOS
Gas: N2, O2, C2F6
EBARA AA10 Pump
EBARA AAS200WN
Transformer
Power system
1992 vintage.
NOVELLUS CONCEPT One-200 is a unique and revolutionary etch/dep tool for advanced technology nodes. It is designed for high-volume production manufacturing of cutting-edge Integrated Circuit (IC) devices and chips. This etch/dep tool achieves superior within-wafer and across-wafer uniformity, resulting in excellent final device performance, yields, and reliability. The equipment uses a plasma-based reactive ion etching (RIE) and metal deposition (CVD) technology, which uses high-concentration plasma to etch and deposit materials. The plasma, which is produced with a large powered source, allows more precise control over the etching process, allowing for deeper and more even etching in specific areas of the IC. The plasma also helps to deposit materials more precisely, resulting in a thinner and more uniform metal layer. The system also features an advanced wafer handling unit that uses sophisticated robotic arms to move and rotate wafers with precision, allowing for precise position adjustment and providing very low-temperature condensation of the plasma species during transfer of the wafer to the process chamber. This helps to increase material uniformity and allows for higher layer counts and improved device performance. CONCEPT One-200 uses a modular design, which is composed of three process chambers, a transfer chamber, and a sub-atmospheric process chamber. This enables simultaneous deposition and etching on a single wafer in each of the three process chambers, thus providing a highly efficient and cost-effective manufacturing process. The tool is also capable of managing multiple wafers simultaneously, which increases the throughput of the machine. The tool also has an advanced cooling asset to regulate the temperature inside the chambers and ensure uniform process conditions across the entire wafer. This helps to reduce particle contamination and can even extend the life of the etch/dep tools. Overall, NOVELLUS CONCEPT One-200 is a revolutionary etch/dep tool that can take high-volume production manufacturing of ICs to the next level. It provides superior uniformity and yields while allowing multiple wafers to be processed in parallel. The advanced wafer handling model and modular design help to further increase its efficiency and cost-effectiveness.
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