Used NOVELLUS CONCEPT One-200 #9171331 for sale

NOVELLUS CONCEPT One-200 is an advanced, multi-functional etch reactor designed for integration into semiconductor manufacturing plants. The equipment is capable of achieving deep, ultra-low temperature etching processes with a great degree of precision and repeatability, making it ideal for high accuracy and high volume production. At the heart of the system is an inductively coupled plasma etch unit, capable of producing temperatures of up to 10,000 degrees Celsius. This plasma is used to create micro-scale structures on the wafer, with a width of less than 1 μm. This precision allows for precise control over etching process parameters, reducing cost, improving yield and increasing product quality. The machine also utilizes a robotic end effector, capable of accurately manipulating the wafer during etching, and a patented wafer rotation tool which minimizes damage to small features. A suite of automated software allows for consistent and repeatable process control, enabling the asset to precisely etch multiple devices in a single run. CONCEPT One-200 also includes a number of features designed to improve model efficiency and throughput. The equipment utilizes a multi-step etch process to minimize wafer wear, and features an algorithm that allows for precise, automated wafer positioning and motion for high-precision etching. NOVELLUS CONCEPT One-200 is designed to be highly adaptable and user-friendly, allowing for a wide range of applications and integration into existing semiconductor fabrication lines. Its rugged, modular construction makes it easy to install and maintain, and its expandable system architecture allows for upgrades and customizations as needed. Overall, CONCEPT One-200 is an advanced etch reactor designed for high accuracy, high throughput and precise, repeatable etching. With its reliable and flexible design, it is an ideal solution for semiconductor manufacturers looking to maximize their production and quality.