Used NOVELLUS CONCEPT One C1-150 #9171330 for sale

NOVELLUS CONCEPT One C1-150 is a three zone horizontal reactor design for applications in the semiconductor industry. This reactor utilizes advanced process control technology to achieve optimal deposition uniformity and repeatability. A wide range of process parameters, such as power, gas flow and pressure measurement, are monitored to ensure proper film quality. The reactor's chamber is divided into three independent zones from front to back: the preheat zone, the reaction zone and the cool down zone. Each zone is equipped with its own showerhead, temperatures and gas flow. Hot and cold Gas Supplies are fed into the chamber in sequence to allow precise control of atmospheric parameters and process timing. Gas flow is balanced between these zones to achieve desired values of gas pressure, velocity, a spatially uniform concentration of reactants, and a uniform temperature profile across the chamber. The substrate is moved through the chamber on a load-lock module. The load-lock module is designed to maintain pressure at a specific level within the reactor so material can be safely transferred from the chamber to the deposition area without venting. The preheat zone ensures that the substrate is at the desired temperature before entering the reaction zone. The reaction zone can be manipulated to control the temperature, gas flow and pressure within the showerhead. The deposition takes place here as the reactants undergo a chemical reaction on the surface of the substrate and reactant deposition thickness is controlled via time and power control. The cool-down zone is used to cool down the substrate to the desired temperature before exiting the reaction chamber. CONCEPT One C1-150 reactor is an advanced system, allowing flexibility and precise control over deposition temperature, pressure, flow rate and reactant concentrations. This makes it ideal for sputter and conformal film deposition for semiconductor applications. The C1-150 is approved for a variety of materials, including gold, cobalt, titanium nitride, and tantalum. With its precise process control and uniformity of deposition, it makes it an excellent choice for industrial processes.