Used NOVELLUS CONCEPT One C1-D #9135536 for sale

NOVELLUS CONCEPT One C1-D is a next-generation high-performance reactor designed by NOVELLUS Systems for advanced deposition and etching applications. It offers improved productivity and superior process performance, allowing for more rapid and efficient fabrication of critical microelectronic components. The reactor's design is based on the concept that it can be tailored to the specific process need of electrochemical deposition, chemical vapor deposition (CVD) or Plasma Enhanced Chemical Vapor Deposition (PECVD) processes. To accommodate this flexibility, the reactor is constructed using a modular approach. This allows users to customize the hardware and process parameters for the specific requirements of the application. The reactor features an optimized energy-saving design that includes several innovative technologies, including the unique Thruster Drive Mechanism, a closed-loop pressure control equipment, adjustable temperature profiles, and process real-time monitoring. The Thruster Drive Mechanism allows for consistent wafer transport and processing at lower energy consumption levels. The closed-loop pressure control system helps achieve greater process uniformity and reproducibility while reducing energy consumption by enabling precise process adjustment. The adjustable temperature profiles allow for higher process speed through increased uniformity, while also reducing energy consumption. Finally, process parameters can be monitored using the onboard real-time monitoring unit, helping ensure optimal process control. The chamber of CONCEPT One C1-D is designed for compatibility with industry standard wafer sizes and capacitively coupled plasma (CCP) technology. The chamber is also equipped with a unique water-cooled RF source that eliminates the need for a large external cooling machine, while also providing high process uniformity and reproducibility. Additionally, the chamber is integrated with an advanced automation tool for quick wafer exchange, uniform electromagnetic fields, and fault detection. Overall, NOVELLUS CONCEPT One C1-D is a revolutionary high-performance reactor designed to meet the demanding specifications of advanced deposition and etching applications. It offers improved process performance, an optimized energy-saving design, and expanded capabilities to help streamline the fabrication of critical microelectronic components.