Used NOVELLUS CONCEPT One #9089208 for sale

NOVELLUS CONCEPT One
Manufacturer
NOVELLUS
Model
CONCEPT One
ID: 9089208
Wafer Size: 8"
TEOS PECVD System, 8".
NOVELLUS CONCEPT One is a cutting-edge, chemical vapor deposition (CVD) reactor that uses advanced process technologies to enable high-precision, high-productivity manufacturing of various products, from semiconductor devices to OLED displays. NOVELLUS CONCEPT ONE is engineered to allow tight process flux control and high throughput for a range of production needs, ranging from research and development to high-volume production. It features a broad range of applications, including high-k CVD and low-k CVD for advanced microprocessors, as well as dielectric deposition for OLED displays and microelectronics devices. CONCEPT One also features remote operate capabilities, which enables users to start, monitor and finish a process from a remote location. This feature allows for automated process control and optimization, ultimately leading to optimized production throughput. The reactor is based on NOVELLUS patented thermal separation chamber (TSC) technology, which provides simultaneous thermal control of multiple chambers and deposition over large areas. This multi-zone chamber enables a very uniform, high-quality deposition across the entire process, eliminating the need for additional tuning or manual adjustment. CONCEPT ONE is equipped with an auto-start feature, which offers a logical, automated process when users set up the reactor. It also has a data collection system, which acquires real-time info during the process, allowing for increased throughput and the ability to evaluate and improve processes quickly. NOVELLUS CONCEPT One is designed and built for flexibility, with interchangeable modules that can be easily removed and interchanged to adapt to different process needs. Additionally, the reactor is compliant with NOVELLUS Ease of Inspection programs, helping ensure that process flow is optimized at all times. Overall, NOVELLUS CONCEPT ONE is a state-of-the-art CVD reactor that uses advanced technologies for increased production efficiency and quality. It features a host of features and capabilities, such as remote operation, auto-start, and multi-zone control, allowing users to increase production speed, improve accuracy, and future-proof their processes.
There are no reviews yet