Used NOVELLUS CONCEPT One #9096029 for sale

NOVELLUS CONCEPT One
Manufacturer
NOVELLUS
Model
CONCEPT One
ID: 9096029
Wafer Size: 8"
Vintage: 1990
PECVD System, 8", 1990 vintage.
NOVELLUS CONCEPT One is a revolutionary reactor technology developed by NOVELLUS Systems, Inc. It is designed to enable the efficient production of thin films and advanced material structures while improving process throughput and product yields. The linear reactor design combines a high-temperature chemical vapor deposition (CVD) source with a high-efficiency heat exchange equipment, producing a wide range of deposition rates and composition control. The use of two independent CVD sources also allows for desirable thin film qualities such as surface uniformity and chemical composition. With over 20 years of experience in the field of material engineering, this reactor technology has enabled advanced processes such as atomic layer deposition (ALD), metal organic chemical vapor deposition (MOCVD), and modified atmospheric chemical vapor deposition (MACVD). NOVELLUS CONCEPT ONE reactor integrates several advanced technologies including a cluster of custom-designed high-temperature CVD elements into a single, linear reactor design. These CVD elements are complimented by a unique heat-exchange system which efficiently distributes heat exhaust and helps manage deposition time and plasma temperatures. The reactor also features a set of containment and regulation systems to help protect operators, as well as create a stable and safe reactor environment. This configuration provides uniform temperature control, efficient process temperature variations, and a large range of deposition rates, allowing for advanced material structure capabilities. CONCEPT One reactor is an example of a sophisticated reaction technology that offers many benefits when compared to traditional systems. It is mobile, easy to use, and energy-efficient, and the ability to perform multiple material processes with a single unit saves time and resources while increasing yields. Additionally, the small size of the machine allows for a minimal footprint in the production environment, making it suitable for research, prototyping, and even industrial applications. Overall, CONCEPT ONE is a powerful and versatile reactor capable of precisely tuning for desired materials and structures. The unique design, triggered by advanced technology, enables the efficient production of a range of thin films and advanced material structures, offering enhanced throughput and product yields in a safe and reliable way.
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