Used NOVELLUS CONCEPT One #9096031 for sale

NOVELLUS CONCEPT One
Manufacturer
NOVELLUS
Model
CONCEPT One
ID: 9096031
Wafer Size: 6"
Vintage: 1996
Nitride / TEOS System, 6", 1996 vintage.
NOVELLUS CONCEPT One is a high-throughput, plasma-based reactor specifically designed for advanced semiconductor manufacturing processes. It is capable of providing process solutions in a single-wafer environment, which enables increased productivity, uniformity and scalability for fabs. NOVELLUS CONCEPT ONE is powered by Drossom, a patented low-temperature arc plasma source that provides ultra-high ion flux (up to 10^20 ions/cm2/sec). This give it the ability to pre-clean and enhance the surfaces of wafers prior to plasma processing. It is the only one of its kind to offer this ultra-high ion flux while maintaining a low total cost of ownership. CONCEPT One also features a Pulsar pre-clean module, which provides high-temperature processing using a single low-pressure process chamber. This module can be used for treating challenges such as carbon deposition and pattern-induced yield loss. It also enables the user to increase process throughput and achieve higher levels of film uniformity. CONCEPT ONE has a distributed architecture, with four reactors combining two or four processes for maximum throughput. This allows for rapid scaling and supports advanced processes such as polysilicon deposition and doping. The reactor is highly accurate and utilizes advanced auto-tune algorithms for rapid optimization and repeatability. NOVELLUS CONCEPT One is a revolutionary platform for next-generation semiconductor manufacturing, with an unprecedented combination of highly-accurate process controls, exceptional uniformity and fast throughput. It offers an ideal solution for high-volume manufacturing capacity and is the only high-throughput reactor purpose built for advanced process technologies.
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