Used NOVELLUS CONCEPT One #9096032 for sale

NOVELLUS CONCEPT One is a next generation etch reactor designed to enable faster and more efficient processing of wafers within a semiconductor manufacturing environment. It features breakthrough process capabilities that enable product manufacturers to scale their productivity, while driving costs down. NOVELLUS CONCEPT ONE utilizes a novel combination of physical, chemical, and biological components to achieve the highest etch rate performance in its class. At the core of the reactor is an innovative combination of ultra-thin films and micro-structures which form an advanced ultra-high-density plasma (UHDP) to drive etch rate and optimize process performance. The advanced etch process provides superior precision, selectivity, and reproducibility compared with conventional etch processes, enabling customers to reduce time to yield and overall process time. The reactor also features a unique robotic arm design, which allows for direct and precise operation of wafer handling equipment, as well as automated wafer inspection. This advanced wafer handling capability ensures extremely tight control of the process and significantly reduces cost-per-wafer. CONCEPT One also features a proprietary combination of uniform gas distribution and gas flow control to further ensure process repeatability and reliability. This unique gas distribution system utilizes advanced geometries to ensure uniform delivery of the etchant and process gases, enabling rapid optimization of etch rates and process conditions. Finally, CONCEPT ONE features a novel approach to post-processing. The integrated post-processing capabilities allow for quick and easy incorporation of additional processes into the etch cycle, allowing for combination processes such as cleaning and PVD, or PVD and etching. This advanced post-processing feature enables shorter process times, improved wafer quality, and significant cost savings. In summary, NOVELLUS CONCEPT One is a reliable, high-performing etch reactor that enables higher throughput, faster cycle time, and significantly reduced costs. By utilizing ultra-high-density plasma, robotic arms, uniform gas distribution, and advanced post-processing capabilities, it provides manufacturers with the tools they need to scale their productivity and maintain competitiveness in the ever-evolving semiconductor market.