Used NOVELLUS CONCEPT One #9096052 for sale

NOVELLUS CONCEPT One is an advanced Technology Etch Reactor developed by NOVELLUS Systems, Inc. for state-of-the-art silicon etch applications. This reactor features Dynamic End Point Control (DEPC) technology, which enables it to achieve dramatically higher etch rates, better process control and improved overlay registration for an ultimate process improvement in semiconductor production. NOVELLUS CONCEPT ONE utilizes the patented DEPC technology which enables the reactor to precisely control the chemically-assisted reactive ion etching (CARE) process, by managing the rate at which ions are introduced into the process and reacting to changing end-point conditions to deliver the best process performance. This technology also allows the reactor to monitor and evaluate the status of the etch process in real time, thus resulting in higher etch rates and improved process precision. CONCEPT One reactor also features a patented and state-of-the-art chamber geometry which reduces gas noise and enhances process stability. This reactor is equipped with a Fast Forward Gas Delivery System which facilitates quick and precise gas delivery, and a proprietary Contactor Edgestripet which provides smooth edges and better anisotropic etching profiles. For ultimate performance, CONCEPT ONE reactor can be configured with a variety of advanced process control options including Process Monitoring, Process and Quality Assurance, Process Data Collection and Process Recipe Management, which allow for total process control and improved operational efficiency. The reactor also supports advanced process recipes for a wide range of applications, further increasing process flexibility and control. In conclusion, NOVELLUS CONCEPT One is the ideal etch reactor for advanced semiconductor production, allowing for higher etch rates, better process control, improved overlay registration and greater process stability, which makes it the perfect tool for improving semiconductor fabrication processes.