Used NOVELLUS CONCEPT One #9101005 for sale

NOVELLUS CONCEPT One is a revolutionary reactor capable of delivering high-performance, high-throughput, low-temperature passivation and etch processes in a single equipment. It is the first of its kind in the industry and is designed to tackle the industry's most complex challenges—from advanced logic devices to high-aspect-ratio contact structures in advanced packaging. NOVELLUS CONCEPT ONE reactor operates with a unique combination of a 1400°C hotwall, shallow trench isolation (STI) etching capability, and high-throughput substrate handling. The hotwall produces high rates of deposition, low temperatures of thermal process, and a limited chemical activity. This allows for a quicker jump to new technology nodes and improved device yields in the most advanced applications. The shallow trench isolation (STI) etching is designed to yield high-quality, high-aspect-ratio features on chip features. The system's high-throughput substrate handling makes it possible to pattern over hundred of wafers per hour. This high-performance etch capability enhances the critical aspect ratio and overall image quality without sacrificing throughput. The flexibility of CONCEPT One reactor also allows for use in both tape-out and production atmosphere. The Variable Pressure Chamber (VPC) unit allows for dynamic interface between the user and the chamber to ensure that all variations of environmental conditions are addressed in real-time to ensure quality product. This is done by both matching the vacuum and gas flows on the substrate to external input of the application. CONCEPT ONE is also equipped with several advanced high-performance features. It is capable of providing process monitoring feedback, as well as performance feedback through the use of a dedicated sensor array. This allows the machine to self-adjust to changing process environment in order to maintain the ultimate performance of the application. Additionally, the tool's self-learning capabilities give it the ability to optimize the parameters of each specific application. Together, NOVELLUS CONCEPT One reactor takes passivation and etching process to new levels, delivering high-quality yield quicker than ever before. Exciting new performance potentials are made possible with NOVELLUS CONCEPT ONE and its cutting-edge features.