Used NOVELLUS CONCEPT One #9113371 for sale

NOVELLUS CONCEPT One is a type of reactor designed for the chemical vapor deposition (CVD) of thin films. The reactor is designed for maximum efficiency, providing the highest performance and productivity for various processes. It is designed for the deposition of self-assembled monolayers (SAMs), and can deposit up to five layers in a single cycle. The reactor is equipped with a high-performance valve, solution control equipment (SCS), and advanced process control systems. NOVELLUS CONCEPT ONE reactor is capable of controlling substrate temperature, reaction chemistry and deposition pressures, as well as other parameters. It is also equipped with a high-precision gas control system, which allows for the control of gas and vapor flow rates. The reactor utilizes multiple electrodes and power sources. This feature provides flexibility in the deposition process, allowing for the user to easily adjust the temperature, solution, pressure and gas flow to optimize deposition of the thin film. CONCEPT One has an advanced temperature control unit that maintains temperature for various processes, such as Thermal Assisted CVD (TAV), Oxygen Assisted CVD (OAV) and Chemical Assisted CVD (CAV). The temperature is regulated by multiple thermocouples, which are placed inside the chamber and are monitored in real-time. This machine is superior to typical temperature controllers, which shift the temperature abruptly and require frequent tool recalibration and manual adjustments. CONCEPT ONE's Advanced Solution Control Asset (SCS) provides unparalleled control over solution chemistry. It consists of two components: the Anodic Activation and Cathodic Activation. The Anodic Activation allows for the substrate and sample to be precycled by potential, temperature, and reaction time. The Cathodic Activation allows for the substrate to be postcycled by potential, temperature, and reaction time. This model increases the reliability and reproducibility of the deposition process. NOVELLUS CONCEPT One reactor is designed with an advanced process control equipment that serves as the primary interface between the user and the reactor. It provides instructions for all the processes, as well as real-time feedback on the process parameters. The information provided by this system is also used to optimize the deposition process. The unit is capable of diagnosing anomalies, taking corrective action and providing detailed histograms of the processes. All of the features mentioned above come together to make NOVELLUS CONCEPT ONE an efficient and highly productive reactor for use in chemical vapor deposition applications. The machine enables a user to accurately control the deposition parameters for various processes, optimize the process, and increase the throughput and yield of the deposition. With its advanced features, CONCEPT One is a superior reactor for depositing thin films.