Used NOVELLUS CONCEPT One #9144774 for sale

NOVELLUS CONCEPT One is a high-performance single-wafer reactor designed for advanced deposition and etch processes in semiconductor manufacturing. Using a novel single-wafer architecture, NOVELLUS CONCEPT ONE provides superior control and yields, with optimized wafer symmetry and uniformity. CONCEPT One is designed for reduced particle counts and is equipped with advanced process monitoring and control capabilities. It features a modular, single-wafer design with a heated substrate to maximize uniformity, and an advanced gas flow equipment to ensure precise control of pressure and flow rates. CONCEPT ONE has a four-quadrant vacuum chamber design and separate chambers for each process to minimize cross contamination. It also includes a unique transport mechanism with four independent carriers, which results in improved wafer throughput and uniformity. In addition, NOVELLUS CONCEPT One has a proprietary motor system and control board that enables enhanced temperature and pressure control. For depositions, NOVELLUS CONCEPT ONE supports a wide range of substrates and materials, including both conductive and non-conductive films. The reactor has an adjustable water-cooled ceramic frame and an advanced optical microscope that ensures precise alignment. The unit also includes an automated substrate surface inspection stations to ensure repeatability and uniformity. For etching, CONCEPT One is designed for reduced operational costs, improved yields, and superior wafer uniformity. The reactor features a novel inductively coupled plasma source, which is designed to reduce plasma damage and improve step coverage. In addition, the reactor supports a variety of etching chemistries, including wet and dry chemistries. CONCEPT ONE is also equipped with an advanced process control machine which provides real-time insight into the entire process. This feature allows users to monitor process parameters, gain insight into process conditions, and optimize process parameters. This feature also enables faster calibration and process set-up times. NOVELLUS CONCEPT One is a highly-advanced, high-performance single-wafer reactor designed for the most demanding applications. It features a novel design and advanced features, which enable superior performance and uniformity in deposition and etch processes. NOVELLUS CONCEPT ONE is ideal for semiconductor and other advanced technology applications.