Used NOVELLUS CONCEPT One #9144937 for sale

NOVELLUS CONCEPT One is a high-speed, high-performance etch and deposition reactor designed for use in the advanced semiconductor manufacturing process. It utilizes state-of-the-art technology to deliver low-cost, high-quality film deposition and etching in a variety of materials such as silicon, germanium, copper, aluminum, and some other materials. NOVELLUS CONCEPT ONE reactor has a unique design that provides a large area of single wafer processing at high speed while maintaining a small footprint. This allows for the most efficient use of space in the factory. CONCEPT One has an advanced temperature control equipment that includes a self-adjusting temperature controller and direct current (DC) bias. This advanced temperature control system reduces chamber instability under varying loads, thus decreasing the possibility of thermal damage. CONCEPT ONE reactor also features a high-speed, high-precision flow control unit to ensure precise film deposition rates. This machine allows for the most uniform and reactive deposition of films at the wafer surface. In addition, the reactor features a high-performance plasma generator. This generator is designed to deliver high concentrations of reactive species to the wafer surface that effectively etch thin films. NOVELLUS CONCEPT One reactor also includes a load lock chamber and load/unload management tool. This asset simplifies the process of loading and unloading wafers into and out of the model, resulting in increased productivity and safety in the factory environment. Degaussing, gas injection lines, and safety controls are also included for operator safety. Finally, the reactor comes with a powerful software user interface that makes the equipment easy to operate and program. This allows for features like real-time monitoring and diagnostics, recipes, remote operation and control, and data logging. The user interface also supports multi-stage set-up and customization of the system for maximum ease of use. Overall, NOVELLUS CONCEPT ONE is a powerful and reliable reactor designed for high-quality, high-precision etching and deposition in a variety of materials. Its advanced temperature control unit, precise flow control, and high-performance plasma generator make it the ideal choice for today's advanced semiconductor manufacturing processes.