Used NOVELLUS CONCEPT One #9148239 for sale

NOVELLUS CONCEPT One is an advanced chemical vapor deposition (CVD) reactor designed to enable materials scientists and engineers to create high-performance, ultra-uniform thin film coatings. It is powered by the powerful NOVELLUS CONCEPT ONE CVD platform, which provides ultra-precise temperature, pressure and composition control. This ensures that the exact composition and uniformity of the coating is achieved each and every time. CONCEPT One system is capable of delivering an even, consistent deposition rate as well as a high uniformity of film thickness. This is enabled by a number of features, including its embeddable dry film nozzle, dual chamber design, and next-generation electro-optic head. The embeddable dry film nozzle of CONCEPT ONE is unique in that it can be easily tweaked to suit a range of application processes, such as etching, deposition, and sputtering. This effectively helps to adjust the rate of deposition, while at the same time allowing for ultra-uniform deposition rates. NOVELLUS CONCEPT One's dual chamber design serves two purposes. First, the inner chamber contains a variable pressure environment that is used to control the temperature of the deposition process. This is achieved by using either argon, nitrogen or air, depending on the properties of the material that is being processed. The outer chamber of NOVELLUS CONCEPT ONE then serves as an environmental chamber, providing an isolated atmosphere around the nozzle and reducing the effect of external environment changes on the coating process. This allows for repeatability and consistency in the results. CONCEPT One also boasts an innovative electro-optic head. This measures and adjusts the intensity of the coating beam as it is being applied, ensuring that the optimal amount of beam energy is used to create the desired coating. This optimizes the speed of the deposition and results in high uniformity of the coatings. Overall, CONCEPT ONE is an advanced chemical vapor deposition reactor that enables materials scientists and engineers to create high-performance, ultra-uniform thin film coatings. It is powered by the powerful NOVELLUS CONCEPT One CVD platform, which provides ultra-precise temperature, pressure and composition control. It also features an embeddable dry film nozzle, dual chamber design, and next-generation electro-optic head, all of which effectively help to create a uniform, high-quality coatings.