Used NOVELLUS CONCEPT One #9148330 for sale

NOVELLUS CONCEPT One is an advanced etch reactor developed by NOVELLUS Systems, Inc. It features a patented Jet Immersion process, which is used to precisely control the flow of gases in a reaction chamber and quickly etch structures on substrates. NOVELLUS CONCEPT ONE eliminates the need for conventional etch ignitors, allowing etch times to be reduced up to 60%. CONCEPT One features a vacuum-sealed chamber, with multiple gas inputs and gas exhaust manifolds. The chamber is equipped with an etch gas inlet, and a gas diffusion system that disperses the etch gas in an efficient, uniform and uniform flow. The etch gas is then trapped in a cyclone blanket, allowing for a very uniform, even etching of the substrate. CONCEPT ONE is a low cost etch reactor, with an economic cost effectiveness offering a wide variety of etch processes. It is equipped with a PLC controller to allow for precise control of the etching process, such as gas flow rate, temperature, pressure and overall operating conditions. This allows for optimal process yields and superior etch quality. The jet immersion process ensures that etch area to be etch is completely covered with etch gas and the amount of gas used can be tightly controlled. The process takes place in a low pressure environment and etch times can be reduced up to 60%. NOVELLUS CONCEPT One also features advanced dielectric etch processes. These processes feature multi-gas plasmas and a dynamic high- performing magnetic field, allowing for optimal etch quality. The adjustable RF plasma also affords greater process control, reducing the need for continual modifications. The Concept 1 also offers a dual source plasma option. This feature allows for dynamic processes that are more robust and yield higher quality etches. The dual source plasma also reduces the need for recharging the plasma chamber and increased etching productivity. NOVELLUS CONCEPT ONE is ideal etch reactor, offering rapid reaction times, reliable processes and cost effective operation. It is suitable for a wide range of industrial applications, providing precision etching of substrates, with optimal process yields and superior etch quality. CONCEPT One is a powerful and economical etch reactor and is essential in the manufacture of important components and devices used in almost all industries.