Used NOVELLUS CONCEPT One #9149818 for sale

NOVELLUS CONCEPT One reactor is a next-generation manufacturing tool designed to deliver superior performance and equipment flexibility through innovative design. At its core, NOVELLUS CONCEPT ONE reactor is a high-temperature chemical vapor deposition (CVD) system designed to deliver superior performance through features such as fast substrate cooling, superior temperature and process control, fast substrate exchange, and short thermal cycles. The reactor is designed to maximize process flexibility and capability through features such as multiple process head tools and multiple process chambers, providing the ability to process up to four different process recipes simultaneously. The unit is compatible with a variety of materials and substrates, including standard silicon, gallium arsenide, nitride, and more. The machine is also capable of handling a wide variety of process parameters for each of the materials. CONCEPT One reactor's temperature control tool ensures that each process step is executed at an optimal temperature. The temperature control monitors the temperature of the substrate during the cycle and uses advanced algorithms to optimize the temperature for each process. Additionally, the wide temperature range of the asset enables a wide variety of deposition processes. The model also features a fast substrate loading/cooling equipment, which provides quick generation of superior results with even faster turnaround times. The system features a fast substrate loading/cooling mechanism, enabling rapid substrate change times of up to 60 seconds. This helps to control deposition uniformity and minimize particle accumulation. CONCEPT ONE is an advanced unit based on a multi-chamber design and an intuitive user interface. This machine is capable of providing reliability, flexibility, and consistently uniform results. The tool is designed to achieve high throughput rates and minimize downtime, delivering superior performance with the repeatability and speed demanded by the most challenging processes.