Used NOVELLUS CONCEPT One #9158667 for sale

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Manufacturer
NOVELLUS
Model
CONCEPT One
ID: 9158667
Wafer Size: 6"
Vintage: 1989
PECVD System, 6" 8" Capable 1989 vintage.
NOVELLUS CONCEPT One is a revolutionary reactor technology developed by NOVELLUS Systems for use in advanced semiconductor production processes. The reactor is comprised of a graphite re-entrant vessel, a heated process zone and a quartz in-line insulation around the process zone. The vessel contains a stepped, closed loop structure with five sections; Mainline Valve, Upstream Valves, Downstream Valves, Pre-Reactor and Reactor. The Mainline Valve acts as an inlet valve, controlling the flow of process gas into the reactor in order to create the desired process conditions. The Upstream Valves are used to control the upstream pressure and initiate process start-up, and the Downstream Valves are used to regulate the pressure in order to maintain the desired process conditions. The Pre-Reactor section contains the substrate heater, providing uniform heating to the process zone before the reactor. The Reactor section is then composed of two Chambers, the Process Chamber and the Substrate Chamber. The Process Chamber contains the gas injector, which is used to apply the desired process gas into the chamber, and the mass flow controllers, which evenly distributes the gas through the chamber. A stainless steel liner within the Process Chamber is lined with graphite insulation, while quartz insulation is placed around the outside of the chamber. This helps to maintain the temperature of the process zone, while the process chamber itself has a horizontal design to ensure an even heating rate throughout. The Substrate Chamber also contains a quartz insulation layer, to help maintain the desired temperature, as well as quartz-lined gas injectors and mass flow controllers to provide a uniform application of process gas during the semiconductor fabrication process. NOVELLUS CONCEPT ONE reactor is designed to deliver uniform, high-temperature processes into the substrate. It has already proven to be a reliable and effective system for advanced semiconductor production, with a simplified and efficient design that allows for flexibility, easily adjustable gas flow and minimal maintenance requirements.
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