Used NOVELLUS CONCEPT One #9183491 for sale

Manufacturer
NOVELLUS
Model
CONCEPT One
ID: 9183491
CVD System Includes: Pumps Generators.
NOVELLUS CONCEPT One is an advanced, single-wafer reactor system for semiconductor manufacturing. It combines the latest in high-throughput, low-cost-of-ownership thin film deposition technology with revolutionary new features designed to increase process capability and reliability. At its core, NOVELLUS CONCEPT ONE houses multiple deposition reactors configured with new or existing Thin Film Deposition Processes (TFDPs). These reactors are capable of depositing thin films of the most technologically demanding materials such as ultra-high-k dielectrics, oxides, nitrides, and metal oxides. Overall, CONCEPT One offers a unique, cost effective approach to thin-film deposition technology. Its state-of-the-art design provides a multi-reactor, inline formation solution that can access a variety of process technologies. It makes possible unprecedented predictability, repeatability and device lifetime while substantially lowering process cost. CONCEPT ONE has several distinct advantages over traditional single wafer non-inline deposition systems. For one thing, its automated, integrated platform has been engineered to maximize the performance and efficiency of a wide range of process technologies without manual labor. By eliminating the need for separate chambers and systems for each stage of the deposition process, NOVELLUS CONCEPT One provides a more cost effective, reliable and repeatable TFDP solution. Moreover, NOVELLUS CONCEPT ONE utilizes a proven flow reactor design that guarantees uniformity across the wafers and delivers exceptional levels of precision and repeatability. Through the use of a modular design, CONCEPT One allows users to quickly customize reactors for the best possible performance for any given application. What's more, CONCEPT ONE's advanced surface analyser and in-situ gas control technology ensure uniformity across the wafer at all time, ensuring the highest quality results. The control over the process environment, coupled with its high deposition rates, contribute to an unsurpassed level of uniformity and yield across wafers, making NOVELLUS CONCEPT One the perfect choice for advanced 3D packaging and interconnect applications. Finally, the reliable, easily maintainable platform of NOVELLUS CONCEPT ONE is ideal for both small and large scale production. In short, it offers a great balance of high performance, low cost-of-ownership, fast process setup and low maintenance requirements. All of this adds up to a versatile, modular and endurable system perfect for advanced semiconductor manufacturing.
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