Used NOVELLUS CONCEPT One #9194261 for sale
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NOVELLUS CONCEPT One is a revolutionary new type of precision processing reactor which is widely regarded as the most cutting-edge and versatile tool for fabrication, deposition and etching of semiconductor wafers. This reactor is widely utilized in today's most advanced semiconductor manufacturing processes and is capable of depositing a wide variety of metals, oxides, nitrides and other materials onto microscopic semiconductor wafers. NOVELLUS CONCEPT ONE is powered by a multi-process, multi-substrate deposition equipment which facilitates multiple process capability in the same tool. This precision deposition process relies on the use of an in-situ, SpectraLIVE™ laser-based detection system that allows for consistent wafer-to-wafer and set-to-set process data. This unit also allows for high precision in the deposition process and enables tight process control with both organics and inorganics. At the heart of CONCEPT One is a novel magnetron sputter source that is designed to provide extreme precision in the deposition process. This source can be tuned to provide deposition of materials such as copper, titanium/tungsten, and nickel-phosphorous. Additionally, this source is also capable of precisely depositing nitride-oxide materials such as aluminum nitride and aluminum oxide. The magnetron source enables ultra-fine etching of material patterns onto the substrates, allowing for the creation of sub-micron structures. This advanced machine also utilizes advanced plasma control with its popular Rapid Thermal Processing (RTP) tool. This asset can cut process times by nearly 75%, as compared to conventional methods. RTP enables uniform heating across the substrate as well as fast annealing of wafers. This results in improved step coverage and faster processing throughput. CONCEPT ONE reactor is a powerful tool for advanced semiconductor manufacturing processes and is well-suited for the fabrication of both low- and high-density micro-electronic devices. The combination of the magnetron sputter source and the RTP model ensures extremely precise deposition of materials which lead to improved performance and reliability. This revolutionary reactor is the perfect tool for any advanced semiconductor manufacturing process and will help bring the industry to the next level.
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