Used NOVELLUS CONCEPT One #9224615 for sale

NOVELLUS CONCEPT One is a PECVD/CVD infrared-induced plasma enhanced chemical vapor deposition (PE-CVD) reactor designed to enable low temperature deposition of thin film layers. It has been designed with a combination of features, making it a flexible and reliable platform for materials deposition in various industries, including the microelectronics, automotive, and aerospace industries. The reactor consists of several main components: the RF source, the process chamber, the process control equipment, and the process robot. The RF source is used to generate the plasma source that is used during the deposition process. The process chamber is the chamber in which the deposition happens, and it typically contains a substrate holder, a lower electrode, and a gaseous precursor delivery system. The process control unit is used to control the process parameters (e.g. pressure, temperature, gas flow) throughout the deposition process. The process robot is responsible for loading and unloading of sample substrates and the transfer of substrates within the process chamber. The reactor is able to achieve very low temperature deposition because of its unique design. The lower electrode utilizes low temperature plasmas, and the upper electrode utilizes high temperature plasmas. During the deposition process, the lower electrode's plasma is used to produce a homogeneous temperature, which allows for uniform deposition results. The upper electrode's plasma also serves to reduce the surface contact point temperature, which further reduces substrate temperature during the deposition process. In order to further improve the process, NOVELLUS CONCEPT ONE is designed with an advanced closed-loop process control machine. This tool uses a number of sensors to monitor process parameters, such as the position of each electrode, the temperature of the substrate, gas flow rate, and so forth. This asset can then be used to fine-tune the process parameters as needed to ensure repeatability and optimal deposition results. Overall, CONCEPT One is a reliable and flexible deposition platform that is able to deliver repeatable deposition results at very low temperatures. Its unique design, advanced process control model, and tool-less operation make it an ideal choice for applications that require rapid, low temperature deposition of thin film layers.