Used NOVELLUS CONCEPT One #9225569 for sale

NOVELLUS CONCEPT One is a revolutionary reactor specifically designed for advanced semiconductor deposition applications. This unit combines a high-performance plasma source with a specialized remote chamber, providing the capability to further enhance semiconductor processing. This advanced equipment offers a number of significant benefits. NOVELLUS CONCEPT ONE utilizes a unique plasma source to deliver significant improvements in film quality and repeatability. The plasma source gives you the ability to customize the process rapidly and accurately to optimize process results. The remote chamber allows for more efficient use of gas and increased deposition rate, resulting in superior processing capabilities. With advanced substrate heating and cooling capabilities, CONCEPT One can reach temperatures up to 800 degrees Celsius and provides fast and efficient thermal control. The reactor delivers ultra-fast turn-on times, with only a few minutes between start-up and full throttle. In addition, the almost limitless scalability of the system allows for up to eight chambers with eight sources each and can be easily synchronized. CONCEPT ONE also features an integrated PC- and PLC-based electrical and control unit, allowing full automation of various processes. This unique combination of features allows process engineers to easily switch between deposition and etch recipes. As a result, this sophisticated equipment increases throughput, yields and uptime. NOVELLUS CONCEPT One is a fully automated reactor machine and has been designed to handle a wide range of processes including low- and ultra-low-k dielectrics, tungsten, copper, noble metals, and even gallium arsenide. It can accurately position wafer substrates within a few hundred microns, and offers several built-in safety features. Overall, NOVELLUS CONCEPT ONE is an excellent choice for advanced semiconductor deposition applications. With its incredible automation capabilities and improved performance, this unit can significantly streamline and optimize the processing of semiconductor substrates. The high-precision deposition profiles and quick turn-on times make it an ideal choice for today's complex manufacturing environments.