Used NOVELLUS CONCEPT One #9255441 for sale

NOVELLUS CONCEPT One is an advanced chemical vapour deposition (CVD) reactor that enables the growth of high performance thin-film materials. It features industry-leading process capabilities and highly efficient production control with advanced control logic software. NOVELLUS CONCEPT ONE consists of an advanced upper chamber and a lower chamber. The upper chamber is equipped with a low-pressure RF/DC plasma source that uses advanced compensation and radiation control technologies to provide exceptional uniformity across the wafer surface. The lower chamber is equipped with two production sources for direct vapor deposition. This enables superior thin film deposition which is ideal for ICs, MEMS, LED, and other devices. CONCEPT One also features a radio frequency (RF) generator to manage plasma powders. This helps to effectively control the quality of production, as well as minimizing product shrinkage. The vacuum tight chamber offers enhanced deposition performance and product protection, as well as process stability. CONCEPT ONE is designed for ultimate efficiency and process control, allowing it to work with a range of materials such as aluminum, copper, silicon nitride and silicon oxide. This enables users to deposit thin film layers or nanostructures that meet exacting requirements across the entire IC and MEMS markets. Additionally, NOVELLUS CONCEPT One comes with intelligent temperature and pressure profiling systems to enhance the deposition process. In addition to the reliable quality production and processes, NOVELLUS CONCEPT ONE also provides exceptional cost efficiency. The advanced CVD technology and programming, as well as the efficient production control system combine to provide users with cost-effective thin film deposition. This helps users reduce both cycle times and material costs while maintaining superior quality production. CONCEPT One is a reliable and efficient CVD reactor that enables the growth of high-performance thin-film materials. It is designed for ultimate efficiency and process control and comes with advanced RF/DC plasma source, two production sources and a radio frequency generator. It also boasts intelligent temperature and pressure profiling capabilities, cost efficiency and levels of quality production that meet the strictest requirements in the IC and MEMS industries.