Used NOVELLUS CONCEPT One #9262615 for sale

NOVELLUS CONCEPT One is a CVD (chemical vapor deposition) reactor designed for uniform, repeatable processing of semiconductor devices. This machine was first introduced in 2004 and has become a popular choice for semiconductor and related industries. Its features include superior process repeatability and low cost of operation. Its performance has been improved with each subsequent version, with current designs offering higher throughput and better process control. The heart of NOVELLUS CONCEPT ONE is its process chamber. This is a stainless steel lined chamber with recessed grooves allowing for the placement of multiple process wafers. The chamber is thermally controlled and has an adjustable pressure range. It is also equipped with a quick evacuation system that allows the chamber to be instantly evacuated, which is necessary to initiate the deposition process. CONCEPT One also features a plasma source, which is used to initiate the chemical vapor deposition process. This source produces a monatomic gas, also known as plasma, which is heated and passed through the process chamber. This plasma interacts with the desired material, passing the material onto the wafer. This process is extremely uniform, with each layer being identical in thickness. Other features of CONCEPT ONE include process monitoring and control, as well as an integrated data acquisition system. This data acquisition system allows for real-time observation of the deposition process, enabling engineers to monitor the entire process from start to finish. In a nutshell, NOVELLUS CONCEPT One is a reliable, low-cost CVD tool that provides superior repeatability and process control. It is a highly respected piece of equipment, with many engineers and process engineers recommending it for its flexibility and excellent results. This in turn has ensured its repeated popularity in the semiconductor industry.