Used NOVELLUS CONCEPT One #9268776 for sale

NOVELLUS CONCEPT One is a unique and innovative reactor in the semiconductor industry for etching and deposition applications. NOVELLUS CONCEPT ONE utilizes a high-frequency plasma, created by an RF source, and an inductive coupling coil with an innovative readout design to create uniform and precise etching and deposition of materials. This advanced functionality allows for more efficient etching, deposition and cleaning processes, as well as higher yields and more reliable products. CONCEPT One utilizes two inductive coupled separate coils which are linked together via feedback loop. This provides high quality, uniform and repeatable etching and deposition rates, resulting in higher yields and lower process yields. The high deposition rate ensures that the etch and deposition layers are uniform and of excellent quality. The two induction coils each have a separate Cathode Interface Unit (CIU). This allows for flexibility in setting each induction coil settings independently, resulting in tunable etching and deposition rates. Additionally, the CIUs can be programmed to giveuser-defined settings for the etching process, ensuring precision and repeatability. Another unique feature of CONCEPT ONE is its patented low-temperature drop plasma production equipment. Traditional systems tend to have a high-temperature drop during their deposition processes, resulting in etch uniformity problems which can significantly reduce yields. NOVELLUS CONCEPT One utilizes a low-temperature drop mechanism which dramatically reduces temperature drops, thus improving throughput and yields. In addition to its improved processes, NOVELLUS CONCEPT ONE also greatly reduces maintenance time for semiconductor manufacturing operations. The system is wired to be self-monitoring, making it virtually maintenance-free. Advanced maintenance software allows engineers to run diagnostics without having to enter the unit's operational area, reducing downtime. Overall, CONCEPT One is an innovative reactor designed to provide the ultimate in etching, deposition and cleaning processes, maximizing yields and process times while keeping maintenance time to a minimum. Its advanced features, such as its low-temperature plasma production and user-defined settings, make this machine a robust and reliable choice for semiconductor makers.