Used NOVELLUS CONCEPT One #9270391 for sale
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ID: 9270391
Wafer Size: 8"
Vintage: 1995
CVD System, 8"
Process: Tungsten
Pentium 166 Computer
Front monitor
Front keyboard
Keyboard switch
Valve monitor
Signal tower
Gas valve monitor
EUROTHERM S08 Controller
No showerhead at station 0
Showerhead at station 1
Showerhead at station 2-5
Chamber:
Centering station
Pedestal 1
Pedestal 2-5
Ring hit assembly type: Ceramic tongs
Spindle type: Direct drive
Chamber view ports
No endpoint detector
TRAZAR AMU2-1 RF Marc bins network
KVOSAN RFK30-STI RF Generator
Module / System designation: CP1WV51
Vacuum system
TYLAN GENERAL Throttle valve controller
TYLAN GENERAL (Non heated) Throttle valve
Gate valve: VAT (Non heated)
TYLAN GENERAL 100 Torr manometer
TYLAN GENERAL 10 Torr manometer
TOKYO SEIDEN A-V Trance
Gas box configuration:
A1: Ar
A2: SiH4
A3 H2
A4: No
B1: Ar
B2: WF6
B3: C2F6
B4: N2
B5: N2
CI: Ar
1995 vintage.
NOVELLUS Concepts One (NC1) equipment is a high-performance, multi-chamber semiconductor process reactor built by NOVELLUS Systems Inc. It is part of the Concept series of epitaxial-oxidation reactors. This reactor provides a wide range of process capabilities including epitaxial deposition, oxidation, and photoresist stripping. NC1 is designed to process semiconductor substrates with high uniformity and repeatability. The NC1 system features an advanced chamber architecture that consists of two reaction chambers side by side, positioned on a single track. The two reaction chambers are connected via a common gas manifold and the externally exposed ion source. This unique arrangement allows for a high level of control and uniformity across multiple process steps. The reactors are capable of producing very uniform deposition layers of up to 2 millimeters in thickness and with excellent step coverage. The NC1 unit utilizes a special high-performance software machine called the Advanced Process Control (APC) software package. The APC tool provides advanced process control capabilities by allowing precise control of process parameters such as chamber pressure, temperature, deposition rates and gas flows. This allows the reactor to be optimized for a wide range of applications. The NC1 asset is designed to operate with a wide range of gas chemistries and pressures. This allows for the use of a variety of materials in the coating processes including high-grade silicon, germanium, and nitride. It also enables the use of specialized dielectric and oxide layers, allowing for greater process flexibility. The reactor is able to achieve excellent uniformity and repeatability of up to four ten-thousandths of an angstrom (4 x 10-10). This combined with the flexibility of the APC software package makes the NC1 model one of the most advanced deposition and oxidation systems on the market. The NC1 equipment is constructed of high-grade stainless steel and an inert gas environment, which helps to enhance the safety of operation and ensures the longevity of the system. The unit is further protected by a host of alarms and safety interlocks that notify the operator of any process or safety anomalies. The NC1 machine is a highly advanced and reliable deposition and oxidation tool. It offers excellent process control, repeatability, and accuracy and is ideal for a broad range of high-performance semiconductor fabrication applications.
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