Used NOVELLUS CONCEPT One #9288077 for sale

NOVELLUS CONCEPT One reactor is a semiconductor-processing tool designed for the fabrication of advanced, high-demand microelectronic components. The reactor is characterized by its ability to deliver consistent, repeatable results in the deposition of uniform thin-film materials even over large areas. This equipment provides a previously unattainable level of precision and control to device fabrication thanks to a number of innovative features, such as its patented dual-zone flow architecture. The dual-zone flow design serves to precisely define the source-material and inert gas flow properties, allowing for greater control over the generated thin-films and the rate of deposition. To further refine the deposition process, NOVELLUS CONCEPT ONE is equipped with a "Pressure Management System" that utilizes an actively controlled, ultra-low pressure chamber with an integrated source-material showerhead. These features, along with its ability to monitor, monitor, control and adjust the thin-film deposition process in real-time, ensure that CONCEPT One can process materials with great accuracy and repeatability. Additionally, CONCEPT ONE reactor is designed to meet a broad range of technical requirements. The unit is outfitted with a range of in-situ diagnostics such as on-board spectrometers and a precision optical emission spectrometer. These allow for the in-situ feedback of process data, as well as monitoring of process parameters for improved thin-film deposition quality. The in-situ diagnostic capabilities also extend to the development of performance-focused thin-films, as the diagnostics can be used to optimize the deposition parameters of various source-materials. This makes the process more efficient, as the optimized parameters can be used in future production runs without the need for any additional experimentation. Finally, NOVELLUS CONCEPT One has a robust process control machine that enables automated monitoring of the deposition process. This provides a secure, consistent, repeatable and cost-effective performance for the fabrication of the most challenging and demanding electronic devices. In sum, NOVELLUS CONCEPT ONE reactor is an advanced, effective, and highly precise solution for the deposition of thin-film materials with superior uniformity and uniformity across large areas.