Used NOVELLUS CONCEPT One #9300350 for sale

NOVELLUS CONCEPT One is a reactor designed for semiconductor and other microelectronics manufacturing applications. It is a deposition and etch product line engineered to provide unmatched precision, productivity, and flexibility for demanding processes such as wafer defect (surface defect) reduction, poly-Si gate formation, and copper interconnect formation and isolation. NOVELLUS CONCEPT ONE reactor is divided into three zones: an upper load/unload chamber, a process chamber, and an integrated front end. The upper load/unload chamber can be isolated from the rest of the equipment for easy maintenance, access and service. The process chamber includes a helicoidal turbo-pump and a low-flow trim-valve, allowing for multiple processing steps to be completed without venting. The integrated front end has a high vacuum gate valve, as well as an in-situ deposition monitor used to create a controlled environment. CONCEPT One reactor contains proprietary technology called "CappCycle", which is an advanced high frequency, high power digitized electrostatic chuck (ESC) drive system. This technology is used to reduce gas loading and improve the stability of the plasma. Other features include an independent He supply, an automatic wafer-level pressure control unit, digital ion source harmonics control, and a high reliability end-of-cycle lockout machine. CONCEPT ONE reactor is designed to provide superior deposition uniformity and process yield across a wide range of process conditions. Additionally, the reactor has been designed to provide a very low thermal budget, resulting in minimal thermal damage and improved process control. Furthermore, the proprietary CappCycle technology enables a sustained plasma for increased process repeatability and reduced consumables cost. In conclusion, NOVELLUS CONCEPT One reactor is a unique deposition and etch tool that provides industry-leading precision, productivity, and flexibility for advanced microelectronic and other semiconductor applications. Its advanced tools and technologies, such as CappCycle, provide superior uniformity, repeatability, and thermal budget, while minimizing costs.