Used NOVELLUS CONCEPT One #9364375 for sale

NOVELLUS CONCEPT One is a state-of-the-art, chemical vapor deposition (CVD) reactor designed to provide improved production yields and throughput in the semiconductor fab process. The reactor utilizes a unique, low-pressure, gas-phase deposition process whereby various forms of chemical compounds are employed to form both protective and reactive SiO2 layers on semiconductor wafers. The equipment's main features include a dual-zone, single-stage reaction chamber, a soft-start valve system, a programmable pulse valve and a pulsed gas injection unit, which enable it to deliver consistent, high-quality chemical and physical results. The reaction chamber consists of two distinct zones separated by a series of baffles to control process flow. The first zone consists of the area where chemical compounds are injected into the reaction chamber and the second zone is where the compounds are reacted and deposited onto the wafer. This gives users more control over the reaction conditions during deposition processes and improves processing efficiency, shorten process times and improve yields from the reactor. The soft-start valve machine provides a gradual increase in process pressure, which allows for more flexibility during processing, leading to improved results from the tool. It also prevents potential process flow rate variations as there can be no sudden rise in pressure within the reactor. The programmable pulse valve is designed to inject chemicals in a very precise and timely manner, for accurate control of reaction conditions in the chamber, leading to improved wafer thickness uniformity. The pulse valve, combined with the pulsed gas injection asset, enables users to precisely time the delivery of gases and chemicals, allowing them to easily adjust processing conditions in order to optimize device performance. NOVELLUS CONCEPT ONE has been designed to enable users to perform both low- and high-volume production runs, while delivering consistent performance and reliability. The reactor is capable of handling a wide range of wafer sizes, as well as variances in wafer geometry, giving users the flexibility to produce devices of different sizes and shapes. Overall, CONCEPT One is a highly versatile and reliable CVD reactor for fabricating wafers, offering users improved efficiency, shorter process times, and superior yields.