Used NOVELLUS Inova NExT #9281285 for sale

NOVELLUS Inova NExT is a multi-chamber chemical vapor deposition (CVD) reactor specifically designed to enable the production of high-density structures with advanced materials and processes. This advanced equipment offers unparalleled production capacity for next-generation semiconductor chips and high-performance electronics applications. Inova NExT CVD reactor consists of several independently controlled chambers and features a modular construction. The design allows for multiple CVD processes to be run in sequence or simultaneously. This allows for maximum process flexibility and efficiency in R&D applications and for the production of advanced device structures for maximum yield optimization. NOVELLUS Inova NExT CVD reactor utilizes an advanced, immersion-cooled, ultra-thin wafer carrier allowing for minimal heat distortion to the substrate during processing.The advanced wafer carrier design incorporates swing-out unloading of its substrate. Additionally, the advanced design allows manufacturers to create precise temperature control capabilities at each chamber, boosting process precision and controllability. Inova NExT CVD reactor is equipped with high-performance horizontal and vertical slots, allowing material deposition onto both sides of the substrate. This enables greater material uniformity across the substrate, directly leading to lower defect densities and higher-quality devices and structures. In addition, the vertical orientation of the number offers advantages for advanced material deposition, including enhanced gap filling of deep-trench applications. Equipped with a sophisticated controls system and ultra-responsive sensors, NOVELLUS Inova NExT CVD reactor offers the highest levels of process performance. The sophisticated control unit provides unique accuracy of flow control and temperature setting within each chamber, increasing throughput and performance levels. Inova NExT CVD reactor offers the latest advancements in process semiconductor development and production. This advanced machine provides the ultimate level of repeatability accuracy, controllability, throughput, and cost-effectiveness for high-performance semiconductor applications. In addition, the tool offers superior environmental performance, with full operational and safety compliance in cleanroom environments.