Used NOVELLUS Inova NExT #9313086 for sale

Manufacturer
NOVELLUS
Model
Inova NExT
ID: 9313086
Wafer Size: 12"
Vintage: 2009
PVD System, 12" Missing parts 2009 vintage.
NOVELLUS Inova NExT is a semiconductor processing reactor used for the fabrication of integrated circuits (ICs). It is an advanced multi-wafer processing system that consists of a high-precision wafer transfer module and a processing chamber. The wafer transfer module facilitates wafer movement between the processing chamber and a wafer buffer storage, as well as its associated processing tools. The processing chamber mates with one or more of the associated process tools, to enable parallel processing of multiple wafers. Inova NExT uses two distinct process gases to deposit and etch thin films and perform lithographic patterning. The two gases are nitrogen trifluoride (NF3), which is used to deposit thin film layers, and sulfur hexafluoride (SF6), which is used to etch layers. An on-board mass throughput (MT) system controls and monitors the delivery of these process gases. The delivery control is managed using a proprietary method of "fractional sharing" of gas molecules, which allows for the rapid dispersal of gases in multiple flow directions at an ultra-fine level. The advanced features of NOVELLUS Inova NExT also include a multi-gas module, which provides a combination of both NF3 and SF6 gas control, as well as a special control module that allows users to mix and control the delivery of multiple process gases simultaneously. Additionally, this ultra-precise process chamber offers advanced temperature and uniformity processing, which ensures the integrity of the thin film layer, as well as its desired electrical properties. In addition to the process technologies, Inova NExT includes a suite of proprietary software tools that are used to program and control the operating conditions of the process chamber. This includes features for remote monitoring, control and adjustment of all gas flows, as well as data logging, data archiving, recipe management, environment management and process control. Overall, NOVELLUS Inova NExT provides a robust and highly precise platform for wafer processing, allowing for the development of complex, high-performance integrated circuits. Its advanced process technologies and software tools ensure reliable fabrication of complex ICs, with repeatable and predictable performance.
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