Used NOVELLUS Inova XT #293818927 for sale
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ID: 293818927
Wafer Size: 12"
PVD System, 12"
BROOKS MAG7 Robots
NOVELLUS MC3 Module controller
PFEIFFER Turbo controller
3 CTI / HILEX / BROOKS Cryo pump
BROOKS FOUP Cassette wafer loader
VAT Throttle valve
VAT Controllers
AE PDX 5000 RF Generator
AE RFG 5500 RF Generator
MKS RF Generator
DC Power supply
Right degas chamber
PVD Chamber
Preclean chamber
Left degas chamber
Transfer module, dual blade.
NOVELLUS Inova XT is an advanced wafer reactor designed to deliver the highest level of etch performance while maintaining optimal process repeatability. In particular, Inova XT is a single-wafer plasma-based reactor, capable of depositing and etching materials with exceptional precision, providing the highest level of precision fabrication of device geometries during production cycles. NOVELLUS Inova XT utilizes a highly advanced and integrated system to reduce process variations. The reactor includes two independent modules: a plasma source, and a high-resolution process chamber. The plasma source module uses a centrally-mounted ECR (electron cyclotron resonance) source to efficiently generate plasma to deposit and etch materials. An InnovusTM filter sets the frequency of the source at a certain range to reduce plasma-generated interferences and inhomogeneities. This ensures that the plasma created is of a more uniform, predictable and reliable nature, ensuring a highly repeatable fabrication process. Inova XT also contains an advanced process chamber, which utilizes a combination of accurate RF delivery and independent wafer position control to precisely deposit and etch materials. The chamber uses a series of electrodes or ECR sources to precisely direct RF energy to the wafer. This precision RF delivery is coupled with advanced process control software to ensure the highest level of precision in etching and deposition processes. In addition, each process chamber has its own independently-controlled wafer stage, allowing for optimized process task scheduling for each individual wafer. NOVELLUS Inova XT also features advanced safety protocols to ensure operator safety. The system is equipped with sensors and exhaust systems that monitor plasma density, process pressure, temperature and other processes. If any of these parameters exceed the maximum allowed limits, the system automatically shuts down, aiding in first-rate process control and reliability. In order to provide the highest level of process repeatability and safety, Inova XT comes with a number of upgrade options such as precision process control software and RF delivery systems, advanced plasma source filters, improved heat transfer radiation and advanced safety systems. NOVELLUS Inova XT is the ideal solution for fabricators working with demanding materials and high-precision requirements.
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