Used NOVELLUS Inova XT #9354273 for sale

NOVELLUS Inova XT
Manufacturer
NOVELLUS
Model
Inova XT
ID: 9354273
Wafer Size: 12"
PVD System, 12" ALCU 180nm.
NOVELLUS Inova XT is a semiconductor wafer processing reactor that provides best-in-class process control and automation. It is designed to meet the industry's need for a high-performance platform that is capable of providing productive wafer processing with improved planarization, process control and repeatability. Inova XT features a high frequency drive power supply for faster processing. Its deep reactive ion etching (DRIE) technique enables higher aspect ratios and greater step heights and enables the fabrication of microstructures with complex profiles for a variety of optoelectronic, microelectronic and MEMS device fabrication. The reactor comes equipped with a variety of accessories, such as a high-powered RF generator, a temperature controller, a precise pH indicator, an automated tray and bottle filling system, and a robotic arm. The robotic arm assists with remote loading and unloading of wafers into and out of the reactor and helps minimize cross-contamination. NOVELLUS Inova XT is designed for integration into an industrial environment with several modules and chambers that ensure and maintain its cleanliness and safety. It comes with an advanced process control system that ensures the consistent, safe and repeatable execution of processes, while the user-friendly control systems minimize staff time required for maintenance and operation. The reactor is also designed to be highly efficient at deposition and etching of oxide, nitride and polysilicon layers. Its multi-chamber, wafer-level programmable environment enables the deposition and etching of high-quality layers with nitride, oxide, polysilicon and multi-layer combinations. Inova XT platform offers a low-cost, low maintenance, process-compatible and repeatable system with an integrated robotic arm for efficient automation. The reactor is designed to produce excellent surface planarization, high process repeatability and outstanding productivity in a scalable and modular fashion. It provides superb wafer throughput while eliminating conventional manual operations and maintenance.
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